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Manganese sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basis)
CAS: 7439-96-5 | Mn | 54.94 g/mol
Supplier: Thermo Scientific Chemicals 040864KS
Description
Manganese sputtering target is widely used in coating processing industries like magnetic data storage application, electronic and semiconductor application. It is used also in chemical vapor deposition (CVD), physical vapor deposition (PVD) display and optical applications.
This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.
Spécifications
| Manganese sputtering target | |
| 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick | |
| 7439-96-5 | |
| (metals basis) | |
| MFCD00011111 | |
| Insoluble in water. | |
| [Mn] | |
| 54.94 | |
| CHEBI:35154 |
| 1 Ea. | |
| Hot Pressed | |
| Odorless | |
| Mn | |
| colloidal, mangan, manganese, elemental, cutaval, magnacat, metal alloy, tronamang, fume, mangan polish, compounds | |
| PWHULOQIROXLJO-UHFFFAOYSA-N | |
| manganese | |
| 23930 | |
| 99.95% |
Identifiants chimiques
| 7439-96-5 | |
| 54.94 | |
| PWHULOQIROXLJO-UHFFFAOYSA-N | |
| 23930 | |
| manganese |
| Mn | |
| MFCD00011111 | |
| colloidal, mangan, manganese, elemental, cutaval, magnacat, metal alloy, tronamang, fume, mangan polish, compounds | |
| CHEBI:35154 | |
| [Mn] |
Sécurité et manipulation
missing translation for 'einecsNumber' : 231-105-1
missing translation for 'tsca' : Yes
Recommended Storage : Ambient temperatures
RUO – Research Use Only