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Hydrofluoric Acid 49% LM Prime, Transene
Hydrofluoric acid 49%, CMOS for the electronics industry
Supplier: Doe and Ingalls Management LLC T070868655GAL
Description
In the semiconductor field, it is mainly used for
- Wafer surface cleaning
- Cleaning and etching during chip processing
- Other processes
- In the field of new displays, it is mainly used for glass substrate cleaning, silicon nitride, silicon dioxide etching, etc
- In the field of photovoltaic solar cells, it is mainly used for surface cleaning, etching edge removal, cleaning and velvet making of silicon wafers.
Spécifications
| Hydrofluoric Acid | |
| HDPE | |
| 20.01 g/mol | |
| Electronic |
| 7664-39-3 | |
| 1 gal. | |
| 49% |
Identifiants chimiques
| 7664-39-3 | |
| 20.01 g/mol |